
TSI Introduces The Nano LPM™ System For Semiconductor Ultrapure Water Nanoparticle Detection
In semiconductor manufacturing, UPW is integral for tasks such as wafer and equipment cleaning, etching, and contaminant removal, directly impacting production quality. Particles as small as 10 nm can compromise yield, making real-time detection a vital need. Traditional optical technologies have struggled detecting nanoparticles below 20 nm due to refractive index limitations and interference from microbubbles, often resulting in inconsistent or inaccurate readings. TSI's Nano LPMTM System tackles these limitations with a patented approach that ensures accurate detection of particles at 10 nm, giving semiconductor facilities a robust and consistent monitoring tool.
The Nano LPMTM System sets a new standard in UPW nanoparticle monitoring with its Nano LPM Particle Generator, that aerosolizes UPW, effectively drying droplets and isolating solid nanoparticles. These nanoparticles are then analyzed using the Nano LPM Water-Based Condensation Particle Counter (CPC), optimized for cleanroom environments.
“TSI's Nano LPMTM System represents a significant leap forward for semiconductor manufacturers who need reliable, real-time UPW monitoring at the 10 nm level,” said Ketan Mehta, VP of Product Management and Marketing at TSI.“We're proud to offer a groundbreaking technology that not only ensures compliance but also elevates product quality and yield, transforming environmental control into a critical advantage for our customers.”
To learn more about the instrument, click here .
About TSI Incorporated
Around the globe, TSI provides a comprehensive range of solutions with unparalleled reliability and accuracy necessary to accomplish your goals. From workflow management, software services and measurement instrumentation, our complete suite of solutions are tailored to help you make informed, data-driven decisions to get your job done.
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- Nanoparticle Monitoring in Ultrapure Water


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